Anthony I Chou

This inventor holds 78 USPTO granted patents and 12 published patent applications, primarily in Semiconductor Structures (CPC class H01L). Top assignees: International Business Machines Corporation, Globalfoundries Inc., Adeia Semiconductor Bonding Technologies Inc.. Active years: 2002-2026.

USPTO Granted Patents = 78 (Patent Applications = 12)

% Patents Active = 51.3

Average Co-Inventor Count = 4.3

ph-index = 9

Forward Citations = 322(Granted Patents)

Forward Citations (Not Self Cited) = 226(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Yorktown Heights, NY (US) (2004)
Fishkill, NY (US) (2005)
Hopewell Jct., NY (US) (2012)
Hopewell Junction, NY (US) (2011 - 2013)
Beacon, NY (US) (2002 - 2020)
Becon, NY (US) (2021)
Guilderland, NY (US) (2024)

Company Filing History:

65 out of 166,209

International Business Machines Corporation

Adeia Semiconductor Bonding Technologies Inc.

patents

4. 2 out of 10,850

Tokyo Electron Limited

patents

5. 1 out of 59

Globalfoundries U.S. 2 LLC

patents

where one patent can have more than one assignee

Years Active: 2002-2026

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Areas of Expertise:

High-K Dielectrics

Semiconductor Structures

FinFET Devices

Integrated Passive Components

Field Effect Transistors

Heat Pipes

Junction Butting

On-Chip Resistors

Resistance Adjustment

Dielectric Isolation

Stacked FET Diodes

Conductivity Enhancement

78 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12740150 - Integration of stacked logic device with passive device (2026-09-15),

2. 12707656 - Co-integration of gate-all-around nanosheet logic device and precision mol resistor (2026-08-11),

3. 12690243 - Stacked field-effect transistors having latch cross-coupling connections (2026-07-21),

4. 12677443 - Self-aligned substrate isolation (SASI) of gate-all-around nanosheet field effect transistors (2026-07-07),

5. 12557353 - Method and structure for a logic device and another device (2026-02-17),

6. 12527076 - Stacked FET vertical diode (2026-01-13),

7. 12453170 - Integration of nanosheets with bottom dielectric isolation and ideal diode (2025-10-21),

8. 12040250 - Heat pipe for vertically stacked field effect transistors (2024-07-16),

9. 11894361 - Co-integrated logic, electrostatic discharge, and well contact devices on a substrate (2024-02-06),

10. 11101357 - Asymmetric high-k dielectric for reducing gate induced drain leakage (2021-08-24),

11. 10734492 - Asymmetric high-k dielectric for reducing gate induced drain leakage (2020-08-04),

12. 10580686 - Semiconductor structure with integrated passive structures (2020-03-03),

13. 10381452 - Asymmetric high-k dielectric for reducing gate induced drain leakage (2019-08-13),

14. 10374048 - Asymmetric high-k dielectric for reducing gate induced drain leakage (2019-08-06),

15. 10367072 - Asymmetric high-k dielectric for reducing gate induced drain leakage (2019-07-30),

Title: The Innovative Journey of Anthony I Chou

Introduction: Anthony I Chou, a talented inventor based in Beacon, NY (US), has made significant contributions to the field of technology through his creative and groundbreaking inventions.

Latest Patents: Anthony I Chou holds several patents in various technological domains, showcasing his versatility and ingenuity in innovation.

Career Highlights: Throughout his illustrious career, Anthony I Chou has been recognized for his pioneering work in developing cutting-edge solutions that have revolutionized the industry. His dedication to pushing the boundaries of technology has led to the creation of groundbreaking inventions that have had a lasting impact.

Collaborations: Anthony I Chou has collaborated with leading experts and organizations in the technology sector, fostering a culture of innovation and knowledge-sharing. His collaborative efforts have resulted in the development of groundbreaking technologies that have set new industry standards.

Conclusion: Anthony I Chou's passion for innovation and his relentless pursuit of excellence have established him as a prominent figure in the world of technology. His remarkable inventions continue to inspire and shape the future of technological advancements.