For the Inventor, By the Inventor

Enter assignee name

Somerville, NJ, United States of America

Az Electronic Materials USA Corp.

Calculating rank

USPTO Granted Patents = 115

% Expired Patents = 53.9

EPO Patents = 40

Trademarks = 12

Forward Citations = 763

Loading Chart...

Loading Chart...

136 inventors (with patents filed for the assignee):

Mark O Neisser (22 out of 29 patents)

Ralph R Dammel (19 out of 76 patents)

David J Abdallah (17 out of 17 patents)

4. M Dalil Rahman (17 out of 74 patents)

5. Francis Michael Houlihan (15 out of 36 patents)

6. Hengpeng Wu (13 out of 32 patents)

7. Munirathna Padmanaban (13 out of 32 patents)

8. Huirong Yao (12 out of 22 patents)

9. Yusuke Takano (11 out of 15 patents)

10. Shuji Sue Ding-Lee (9 out of 10 patents)

11. Guanyang Lin (8 out of 22 patents)

12. Joseph E Oberlander (8 out of 21 patents)

13. Jianhui Shan (7 out of 20 patents)

14. Ruzhi Zhang (7 out of 11 patents)

15. Zhong Xiang (7 out of 7 patents)

Core Competencies:

Antireflective Coating

Photoresist Composition

Silicon Polymer

Pattern Formation

Thick Film Resists

Photosensitive Siloxane

Colloidal Silica

Polysilazane

Developable Coating

Hardmask Process

Light-Sensitive Component

Negative Photoresist

115 patents: Sort by Forward Citations

1. 8993214 - Positive photosensitive siloxane composition (2015-03-31),

2. 8969172 - Method for forming isolation structure (2015-03-03),

3. 8906993 - Coating composition containing siloxane resin (2014-12-09),

4. 8906590 - Antireflective coating composition and process thereof (2014-12-09),

5. 8883397 - Positive photosensitive siloxane composition (2014-11-11),

6. 8852855 - Upper surface antireflective film forming composition and pattern forming method using same (2014-10-07),

7. 8828877 - Etching solution and trench isolation structure-formation process employing the same (2014-09-09),

8. 8796398 - Superfine pattern mask, method for production thereof, and method employing the same for forming superfine pattern (2014-08-05),

9. 8715918 - Thick film resists (2014-05-06),

10. 8697336 - Composition for forming a developable bottom antireflective coating (2014-04-15),

11. 8663906 - Silicon-containing composition for fine pattern formation and method for fine pattern formation using the same (2014-03-04),

12. 8632948 - Positive-working photoimageable bottom antireflective coating (2014-01-21),

13. 8623589 - Bottom antireflective coating compositions and processes thereof (2014-01-07),

14. 8618002 - Resist pattern formating method (2013-12-31),

15. 8568958 - Underlayer composition and process thereof (2013-10-29),

Company Overview

Az Electronic Materials USA Corp., located in Somerville, NJ, specializes in the development and manufacturing of advanced antireflective coatings and related materials. The company focuses on innovative technologies such as photoresist compositions, silicon polymers, and photosensitive siloxanes, catering to the semiconductor and microelectronics industries. Their expertise extends to pattern formation and thick film resists, positioning them as a key player in the field of materials science and engineering.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

115 Patents

#4 in Somerville, NJ

#151 in New Jersey

#3,345 in US

#6,902 in the World

Somerville, NJ, United States of America

Az Electronic Materials USA Corp.

Forward Citations = 763

136 inventors:

Mark O Neisser (22 out of 29 patents)

Ralph R Dammel (19 out of 76 patents)

David J Abdallah (17 out of 17 patents)

4. M Dalil Rahman (17 out of 74 patents)

5. Francis Michael Houlihan (15 out of 36 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Az Electronic Materials USA Corp.. Retrieved from https://idiyas.com/company/az-electronic-materials-usa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

Loading…