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For the Inventor, By the Inventor

Somerville, NJ, United States of America

Az Electronic Materials USA Corp.


USPTO Granted Patents = 115


Trademarks = 12

Forward Citations = 758

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136 inventors (with patents filed for the assignee):

goldMedal Mark O Neisser (22 out of 29 patents)

silverMedal Ralph R Dammel (19 out of 76 patents)

bronzeMedal David J Abdallah (17 out of 17 patents)

4.  M Dalil Rahman (17 out of 74 patents)

5.  Francis Michael Houlihan (15 out of 36 patents)

6.  Hengpeng Wu (13 out of 32 patents)

7.  Munirathna Padmanaban (13 out of 32 patents)

8.  Huirong Yao (12 out of 22 patents)

9.  Yusuke Takano (11 out of 15 patents)

10.  Shuji Sue Ding-Lee (9 out of 10 patents)

11.  Guanyang Lin (8 out of 22 patents)

12.  Joseph E Oberlander (8 out of 21 patents)

13.  Jianhui Shan (7 out of 20 patents)

14.  Ruzhi Zhang (7 out of 11 patents)

15.  Zhong Xiang (7 out of 7 patents)


Core Competencies:
Positive Photosensitive Siloxane Composition
Antireflective Coating Composition
Silicon-Based Antireflective Coating
Photoresist Compositions
Polysilazane-Containing Composition
Superfine Pattern Mask
Bottom Antireflective Coating
Coating Composition
Light-Sensitive Component
Thick Film Resists
Etching Solution
Underlayer Coating Composition

115 patents:

1. 8993214 - Positive photosensitive siloxane composition (2015-03-31),
2. 8969172 - Method for forming isolation structure (2015-03-03),
3. 8906993 - Coating composition containing siloxane resin (2014-12-09),
4. 8906590 - Antireflective coating composition and process thereof (2014-12-09),
5. 8883397 - Positive photosensitive siloxane composition (2014-11-11),
6. 8852855 - Upper surface antireflective film forming composition and pattern forming method using same (2014-10-07),
7. 8828877 - Etching solution and trench isolation structure-formation process employing the same (2014-09-09),
8. 8796398 - Superfine pattern mask, method for production thereof, and method employing the same for forming superfine pattern (2014-08-05),
9. 8715918 - Thick film resists (2014-05-06),
10. 8697336 - Composition for forming a developable bottom antireflective coating (2014-04-15),
11. 8663906 - Silicon-containing composition for fine pattern formation and method for fine pattern formation using the same (2014-03-04),
12. 8632948 - Positive-working photoimageable bottom antireflective coating (2014-01-21),
13. 8623589 - Bottom antireflective coating compositions and processes thereof (2014-01-07),
14. 8618002 - Resist pattern formating method (2013-12-31),
15. 8568958 - Underlayer composition and process thereof (2013-10-29),
AZ Electronic Materials USA Corp. is a leading global manufacturer of high-quality electronic materials. We provide a wide range of advanced materials for the semiconductor, photovoltaic, and display industries. Our products are used in the production of integrated circuits, solar cells, and electronic displays. With a commitment to innovation and customer satisfaction, we strive to deliver reliable and sustainable solutions. Visit our website for more information.
This text is generated by artificial intelligence and may not be accurate.

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USPTO Data Jan 1 1976 - Dec 23 2025

115 Patents

#2 in Somerville, NJ

#151 in New Jersey

#3,207 in US

#6,684 in the World

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Somerville, NJ, United States of America

Az Electronic Materials USA Corp.

Forward Citations = 758

136 inventors:

goldMedal Mark O Neisser (22 out of 29 patents)

silverMedal Ralph R Dammel (19 out of 76 patents)

bronzeMedal David J Abdallah (17 out of 17 patents)

4.  M Dalil Rahman (17 out of 74 patents)

5.  Francis Michael Houlihan (15 out of 36 patents)

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