The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
Nov. 02, 2011
Naoko Nakamoto, Shizuoka, JP;
Katsuchika Suzuki, Shizuoka, JP;
Shinji Sugahara, Shizuoka, JP;
Tatsuro Nagahara, Shizuoka, JP;
Naoko Nakamoto, Shizuoka, JP;
Katsuchika Suzuki, Shizuoka, JP;
Shinji Sugahara, Shizuoka, JP;
Tatsuro Nagahara, Shizuoka, JP;
AZ Electronic Materials USA Corp., Somerville, NJ (US);
Abstract
[Problem] To provide a method for forming an isolation structure having a low shrinkage percentage and a low tensile stress. [Means for Solving] A first polysilazane composition containing a porogen is cast on the surface of a substrate to form a coat, and then the coat is fired to form a porous siliceous film having a refractive index of 1.3 or less. Thereafter, the surface of the porous siliceous film is soaked with a second polysilazane composition, and then fired to form an isolation structure of a siliceous film having a refractive index of 1.4 or more.