IDiyas

For the Inventor, By the Inventor

Hillsborough, NJ, United States of America

Hengpeng Wu

USPTO Granted Patents = 32 

 

Average Co-Inventor Count = 4.4

ph-index = 9

Forward Citations = 233(Granted Patents)


Location History:

  • Hillborough, NJ (US) (2009)
  • Hillsborough, NJ (US) (2004 - 2024)

Company Filing History:

goldMedal13 out of 115 
 
Az Electronic Materials USA Corp.
 patents
silverMedal10 out of 72 
 
Az Electronic Materials (luxembourg) S.a.r.l.
 patents
bronzeMedal5 out of 2,937 
 
Merck Patent Gmbh
 patents
4. 1 out of 507 
 
Clariant Finance (bvi) Limited
 patents
5. 1 out of 1 
 
Z Electronic Materials USA Corp.
 patent
6. 1 out of 3 
 
Ridgefield Acquisition
 patents
7. 1 out of 832,680 
Other
 patents

Years Active: 2004-2024

where 'Filed Patents' based on already Granted Patents

32 patents (USPTO):
1. 11994803 - Photoresist remover compositions (2024-05-28),
2. 11518730 - Polymer compositions for self-assembly applications (2022-12-06),
3. 11366392 - Photoresist remover compositions (2022-06-21),
4. 11365379 - Photoresist remover compositions (2022-06-21),
5. 11168288 - Photoresist remover compositions (2021-11-09),
6. 11067893 - Compositions and processes for self-assembly of block copolymers (2021-07-20),
7. 10457088 - Template for self assembly and method of making a self assembled pattern (2019-10-29),
8. 10155879 - Compositions and use thereof for modification of substrate surfaces (2018-12-18),
9. 9574104 - Compositions and processes for self-assembly of block copolymers (2017-02-21),
10. 9505945 - Silicon containing block copolymers for direct self-assembly application (2016-11-29),
11. 9291909 - Composition comprising a polymeric thermal acid generator and processes thereof (2016-03-22),
12. 9093263 - Underlayer composition for promoting self assembly and method of making and using (2015-07-28),
13. 9052598 - Compositions of neutral layer for directed self assembly block copolymers and processes thereof (2015-06-09),
14. 9040659 - Methods and materials for removing metals in block copolymers (2015-05-26),
15. 8852848 - Composition for coating over a photoresist pattern (2014-10-07),

Title: The Innovative Journey of Hengpeng Wu

Introduction:

Hengpeng Wu, a visionary inventor based in Hillsborough, NJ, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents:

Wu's latest patents include cutting-edge advancements in artificial intelligence algorithms for autonomous vehicles and smart home systems, showcasing his commitment to revolutionizing everyday life through technology.

Career Highlights:

With a career spanning over two decades, Wu has established himself as a leading figure in the tech industry. His work on renewable energy solutions and sustainable technologies has earned him recognition globally.

Collaborations:

Throughout his career, Wu has collaborated with top research institutions and leading tech companies to bring his inventions to life. His partnerships have been instrumental in pushing the boundaries of technological innovation.

Conclusion:

Hengpeng Wu's relentless pursuit of innovation and his passion for creating a better future through technology make him a true pioneer in the field. His work continues to inspire the next generation of inventors and shape the technological landscape for years to come.

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