Compositions and processes for self-assembly of block copolymers

Abstract

The present invention relates to novel copolymers containing cross-linkable and graft-able moieties, novel compositions comprised of these novel copolymers and a solvent, and methods for using these novel compositions to form neutral layer films which are both cross-linked and grafted on the substrate which are used in processes for aligning microdomains of block copolymers (BCP) on this neutral layer coated substrate such as self-assembly and directed self-assembly. The novel compositions are comprised of at least one novel random copolymer comprised of least one unit of structure (1), at least one unit of structure (2) at least one unit of structure (3) oneH end group and one end group having structure (1'); where Ris selected from the group consisting of a C-Calkyl, C-Cfluoroalkyl, C-Cpartially fluorinated alkyl moiety, C-Ccycloalkyl, C-Ccyclofluoroalkyl, C-Cpartially fluorinated cycloalkyl, and a C-Chydroxyalkyl; R, Rand Rare independently selected from a group consisting of H, C-Calkyl, CFand F; Ris selected from the group consisting of H, C-Calkyl, C-Cpartially fluorinated alkyl moiety and C-Cfluoroalkyl, n ranges from 1 to 5, Ris selected from the group consisting of H, F, C-Calkyl and a C-Cfluoroalkyl and m ranges from 1 to 3, and n′ ranges from 1 to 5, and n″ ranges from 1 to 5, n′″ ranges from 1 to 5, Ris a Cto Calkyl and X is —CN, or an alkyloxycarbonyl moiety R—O—(C═O)— where Ris a Cto Calkyl andrepresent the attachment point of the end group to the polymer. The novel polymers, compositions and processes are useful for fabrication of electronic devices.