The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2014
Filed:
Jul. 28, 2010
Hengpeng Wu, Hillsborough, NJ (US);
Meng LI, Franklin Park, NJ (US);
Yi Cao, Clinton, NJ (US);
Jian Yin, Bridgewater, NJ (US);
Dongkwan Lee, Bridgewater, NJ (US);
Sungeun Hong, Basking Ridge, NJ (US);
Margareta Paunescu, Clinton, NJ (US);
Hengpeng Wu, Hillsborough, NJ (US);
Meng Li, Franklin Park, NJ (US);
Yi Cao, Clinton, NJ (US);
Jian Yin, Bridgewater, NJ (US);
DongKwan Lee, Bridgewater, NJ (US);
SungEun Hong, Basking Ridge, NJ (US);
Margareta Paunescu, Clinton, NJ (US);
Z Electronic Materials USA Corp., Somerville, NJ (US);
Abstract
The present invention relates to an aqueous composition for coating over a photoresist pattern comprising a first water soluble compound comprising at least a silicon moiety and at least one amino group, and a second compound comprising at least 1 carboxylic acid group. The invention further relates to processes for using the novel invention.