Edison, NJ, United States of America

Meng Li

USPTO Granted Patents = 3 

 

Average Co-Inventor Count = 4.7

ph-index = 3

Forward Citations = 18(Granted Patents)


Location History:

  • Franklin Park, NJ (US) (2014)
  • Edison, NJ (US) (2013 - 2015)

Company Filing History:


Years Active: 2013-2015

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3 patents (USPTO):

Title: The Innovative Contributions of Meng Li

Introduction

Meng Li is a notable inventor based in Edison, NJ, with a focus on developing advanced coating compositions. He holds three patents that showcase his expertise in the field of materials science and photolithography.

Latest Patents

Among his latest patents, Meng Li has developed a range of innovative coating compositions. One of his significant inventions is a developable bottom antireflective coating composition. This invention is crucial for enhancing the performance of photolithographic processes. Another notable patent involves an aqueous composition designed for coating over a photoresist pattern. This composition includes a first water-soluble compound with a silicon moiety and an amino group, along with a second compound containing at least one carboxylic acid group. These inventions reflect his commitment to advancing technology in the field.

Career Highlights

Throughout his career, Meng Li has worked with prominent companies such as Az Electronic Materials USA Corp. and Merck Patent GmbH. His experience in these organizations has contributed significantly to his development as an inventor and innovator.

Collaborations

Meng Li has collaborated with several professionals in his field, including Francis Michael Houlihan and Lin Zhang. These partnerships have likely enriched his work and led to further advancements in his inventions.

Conclusion

Meng Li's contributions to the field of coating compositions and photolithography are noteworthy. His innovative patents and collaborations highlight his role as a significant inventor in the industry.

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