The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2022
Filed:
Aug. 16, 2017
Applicant:
Ridgefield Acquisition, Luxembourg, LU;
Inventors:
Hengpeng Wu, Hillsborough, NJ (US);
Jian Yin, Bridgewater, NJ (US);
Guanyang Lin, Whitehouse Station, NJ (US);
Assignee:
Merck Patent GmbH, Darmstadt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 293/00 (2006.01); G03F 7/00 (2006.01); C07C 69/76 (2006.01); C09D 133/14 (2006.01); C08F 220/30 (2006.01); C08F 212/08 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
C07C 69/76 (2013.01); C08F 212/08 (2013.01); C08F 220/303 (2020.02); C08F 293/00 (2013.01); C09D 133/14 (2013.01); G03F 7/0002 (2013.01); G03F 7/0035 (2013.01); G03F 7/168 (2013.01); G03F 7/2037 (2013.01); G03F 7/70141 (2013.01); C07C 2602/06 (2017.05); C08F 2810/20 (2013.01);
Abstract
The present invention relates to a composition comprises at least one random copolymer having at least one repeat unit of structure (1), The present invention also relates to novel processes for forming patterns using this novel crosslinked layer on a substrate by enable a film of a block copolymer coated on the novel crosslinked layer to undergo self-assembly.