The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2015
Filed:
Feb. 14, 2014
Hengpeng Wu, Hillsborough, NJ (US);
Yi Cao, Clinton, NJ (US);
Sungeun Hong, Basking Ridge, NJ (US);
Jian Yin, Bridgewater, NJ (US);
Margareta Paunescu, Clinton, NJ (US);
Mark O Neisser, Whitehouse Station, NJ (US);
Guanyang Lin, Whitehouse Station, NJ (US);
Hengpeng Wu, Hillsborough, NJ (US);
Yi Cao, Clinton, NJ (US);
SungEun Hong, Basking Ridge, NJ (US);
Jian Yin, Bridgewater, NJ (US);
Margareta Paunescu, Clinton, NJ (US);
Mark O Neisser, Whitehouse Station, NJ (US);
Guanyang Lin, Whitehouse Station, NJ (US);
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L., Luxembourg, LU;
Abstract
The present invention relates to novel processes for using the neutral layer compositions for aligning microdomains of directed self-assembling block copolymers (BCP). The processes are useful for fabrication of electronic devices. The novel processes comprise a step of forming a coating of the neutral layer from the neutral layer composition, wherein the neutral layer composition comprises at least one random copolymer having at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3) where Ris selected from the group consisting of a C-Calkyl, C-Cfluoroalkyl moiety, C-Cpartially fluorinated alkyl, C-Ccycloalkyl, C-Ccyclofluoroalkyl, C-Cpartially fluorinated cycloalkyl, and a C-Chydroxyalkyl; R, Rand Rare independently selected from a group consisting of H, C-Calkyl, CFand F; Ris selected from the group consisting of H, C-Calkyl, C-Cpartially fluorinated alkyl and C-Cfluoroalkyl, n ranges from 1 to 5, Ris selected from the group consisting of H, F, C-Calkyl and a C-Cfluoroalkyl and m ranges from 1 to 3.