The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2016
Filed:
Oct. 30, 2014
AZ Electronic Materials (Luxembourg) S.a.r.l., Somerville, NJ (US);
Hengpeng Wu, Hillsborough, NJ (US);
Jian Yin, Bridgewater, NJ (US);
Guanyang Lin, Whitehouse Station, NJ (US);
JiHoon Kim, North Wales, PA (US);
Margareta Paunescu, Clinton, NJ (US);
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L., Luxembourg, LU;
Abstract
The present invention relates to a novel diblock copolymer comprising a repeat unit (1) and a repeat unit (2), where Ris hydrogen or C-Calkyl, Ris selected from a group chosen from hydrogen, C-Calkyl, C-Calkoxy and halide, Ris selected from a group chosen from hydrogen, C-Calkyl and C-Cfluoroalkyl, and R, R, R, R, R, R, R, R, and Rare independently chosen from a C-Calkyl and n=1-6. The invention also relates to a novel composition comprising the novel polymer and a solvent. The invention further relates to a process utilizing the novel composition for affecting directed self-assembly of the block copolymer.