The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 21, 2022

Filed:

Jan. 23, 2020
Applicant:

Merck Patent Gmbh, Darmstadt, DE;

Inventors:

Hengpeng Wu, Hillsborough, NJ (US);

Guanyang Lin, Whitehouse Station, NJ (US);

Assignee:

Merck Patent GmbH, Darmstadt, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/34 (2006.01); G03F 7/42 (2006.01); C11D 3/34 (2006.01); C11D 3/43 (2006.01);
U.S. Cl.
CPC ...
G03F 7/426 (2013.01); C11D 3/3418 (2013.01); C11D 3/43 (2013.01);
Abstract

The present invention relates to a composition consisting essentially of an alkylbenzenesulfonic acid having structure (I) (wherein n is an integer from 0 to 16); a solvent which is either selected from the group consisting of solvents having structures (II), (wherein R is selected from the group consisting of —(—O—CH—CH—)—OH, —OH, —O—C(═O)—CH, wherein n' is equal to 1, 2, 3, or 4), a solvent having structure (III), a solvent having structure (IV), and a solvent having structure (V), or a solvent mixture, of at least two solvents selected from this group. In another embodiment, the composition also consists of, additionally, a surfactant component. This invention also relates to using either of these compositions to remove a patterned photoresist from a substrate.


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