The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2016
Filed:
May. 17, 2013
Hengpeng Wu, Hillsborough, NJ (US);
Sungeun Hong, Basking Ridge, NJ (US);
Yi Cao, Clinton, NJ (US);
Jian Yin, Bridgewater, NJ (US);
Margareta Paunescu, Clinton, NJ (US);
Muthiah Thiyagarajan, Bridgewater, NJ (US);
Hengpeng Wu, Hillsborough, NJ (US);
SungEun Hong, Basking Ridge, NJ (US);
Yi Cao, Clinton, NJ (US);
Jian Yin, Bridgewater, NJ (US);
Margareta Paunescu, Clinton, NJ (US);
Muthiah Thiyagarajan, Bridgewater, NJ (US);
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L., Luxembourg, LU;
Abstract
The present invention relates a novel aqueous composition comprising polymeric thermal acid generator and a process of coating the novel composition onto photoresist pattern, thereby forming a layer of the polymeric thermal acid generator over the photoresist pattern. The polymeric thermal acid generator comprises a polymer having at least one repeating unit of structure 2; where Rto Rare independently chosen from the group consisting of H and C-Calkyl; Ris chosen from the group consisting of unsubstituted aryl, substituted aryl, alkyl (C-C) and fluoroalkyl (C-C) and W is a C-Calkylene spacer.