The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2014
Filed:
Sep. 12, 2008
Applicants:
Ralph R Dammel, Somerville, NJ (US);
Wen-bing Kang, Kakegawa, JP;
Yasuo Shimizu, Kokubunji, JP;
Tomonori Ishikawa, Kakegawa, JP;
Inventors:
Ralph R Dammel, Somerville, NJ (US);
Wen-Bing Kang, Kakegawa, JP;
Yasuo Shimizu, Kokubunji, JP;
Tomonori Ishikawa, Kakegawa, JP;
Assignee:
AZ Electronic Materials USA Corp., Somerville, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention provides a composition for forming a fine pattern with high dry etching resistance and a method for forming the fine pattern. The composition for fine pattern formation containing: a resin containing a repeating unit having a silazane bond; and a solvent as well as a method for fine pattern formation using the same.