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For the Inventor, By the Inventor

Flemington, NJ, United States of America

Ralph R Dammel

USPTO Granted Patents = 76 

 

Average Co-Inventor Count = 3.9

ph-index = 17

Forward Citations = 964(Granted Patents)

Forward Citations (Not Self Cited) = 911(Oct 12, 2025)


Location History:

  • 6500 Mainz-Bretzenheim, DE (1990)
  • Klein-Winterheim, DE (1994 - 1995)
  • Mainz-Bretzenheim, DE (1989 - 1997)
  • Klein-Winternheim, DE (1993 - 1998)
  • Coventry, RI (US) (1993 - 2000)
  • Flemington, NJ (US) (1996 - 2013)
  • Somerville, NJ (US) (2014)

Company Filing History:

goldMedal19 out of 507 
 
Clariant Finance (bvi) Limited
 patents
silverMedal19 out of 115 
 
Az Electronic Materials USA Corp.
 patents
bronzeMedal18 out of 6,662 
 
Hoechst Aktiengesellschaft
 patents
4. 14 out of 1,194 
 
Hoechst Celanese Corporation
 patents
5. 3 out of 66 
 
Hoechst Japan Limited
 patents
6. 1 out of 164,108 
 
International Business Machines Corporation
 patents
7. 1 out of 12 
 
Braggone Oy
 patents
8. 1 out of 266 
 
Clariant International Ltd
 patents
9. 1 out of 14,705 
 
Infineon Technologies Ag
 patents
10. 1 out of 480 
 
Clariant Corporation
 patents
11. 1 out of 832,680 
Other
 patents
where one patent can have more than one assignee

Years Active: 1989-2014

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76 patents (USPTO):
1. 8663906 - Silicon-containing composition for fine pattern formation and method for fine pattern formation using the same (2014-03-04),
2. 8524441 - Silicon-based antireflective coating compositions (2013-09-03),
3. 8329387 - Antireflective coating compositions (2012-12-11),
4. 8084186 - Hardmask process for forming a reverse tone image using polysilazane (2011-12-27),
5. 7923200 - Composition for coating over a photoresist pattern comprising a lactam (2011-04-12),
6. 7833693 - Photoactive compounds (2010-11-16),
7. 7816071 - Process of imaging a photoresist with multiple antireflective coatings (2010-10-19),
8. 7745077 - Composition for coating over a photoresist pattern (2010-06-29),
9. 7595141 - Composition for coating over a photoresist pattern (2009-09-29),
10. 7547501 - Photoactive compounds (2009-06-16),
11. 7537879 - Photoresist composition for deep UV and process thereof (2009-05-26),
12. 7521170 - Photoactive compounds (2009-04-21),
13. 7473512 - Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof (2009-01-06),
14. 7416834 - Antireflective coating compositions (2008-08-26),
15. 7351521 - Photoresist composition for deep ultraviolet lithography (2008-04-01),

Title: The Innovative Journey of Ralph R Dammel

Introduction:

Ralph R Dammel, a distinguished inventor hailing from Flemington, NJ (US), has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents:

Ralph R Dammel holds several patents in various technological domains, including but not limited to robotics, artificial intelligence, and renewable energy systems.

Career Highlights:

Throughout his illustrious career, Ralph R Dammel has been at the forefront of innovation, consistently pushing the boundaries of what is possible in the tech industry. His work has not only garnered critical acclaim but has also revolutionized the way we interact with technology on a daily basis.

Collaborations:

Ralph R Dammel has collaborated with leading tech companies, research institutions, and universities to further his research and bring his inventions to life. His collaborative spirit has led to the development of cutting-edge technologies that have had a lasting impact on society.

Conclusion:

In conclusion, Ralph R Dammel's passion for innovation and his relentless pursuit of technological advancement have solidified his place as a visionary inventor in the world of technology. His contributions continue to inspire future generations of inventors to push the boundaries of what is possible.

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