The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2012
Filed:
Jul. 08, 2008
Huirong Yao, Plainsboro, NJ (US);
Guanyang Lin, Whitehouse Station, NJ (US);
Jian Yin, Bridgewater, NJ (US);
Hengpeng Wu, Hillsborough, NJ (US);
Mark Neisser, Whitehouse Station, NJ (US);
Ralph Dammel, Flemington, NJ (US);
Huirong Yao, Plainsboro, NJ (US);
Guanyang Lin, Whitehouse Station, NJ (US);
Jian Yin, Bridgewater, NJ (US);
Hengpeng Wu, Hillsborough, NJ (US);
Mark Neisser, Whitehouse Station, NJ (US);
Ralph Dammel, Flemington, NJ (US);
AZ Electronic Materials USA Corp., Somerville, NJ (US);
Abstract
The present invention relates to an antireflective coating composition comprising a novel polymer without an aromatic chromophore, where the polymer comprises a structural unit derived from an aminoplast and a structural unit derived from a diol, triol, dithiol, trithiol, other polyols, diacid, triacid, other polyacids, diimide or mixture thereof, where the diol, dithiol, triol, trithiol, diacid, triacid, diimide, diamide or imide-amide optionally contain one or more nitrogen and/or sulfur atoms or contain one or more alkene groups. The invention also relates to the novel polymer and a process for using the novel antireflective coating composition in a lithographic process.