The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2009
Filed:
Jan. 27, 2005
Francis M. Houlihan, Millington, NJ (US);
Ralph R. Dammel, Flemington, NJ (US);
Andrew R. Romano, Pittstown, NJ (US);
Raj Sakamuri, Sharon, MA (US);
Francis M. Houlihan, Millington, NJ (US);
Ralph R. Dammel, Flemington, NJ (US);
Andrew R. Romano, Pittstown, NJ (US);
Raj Sakamuri, Sharon, MA (US);
AZ Electronic Materials USA Corp., Somerville, NJ (US);
Abstract
The present invention relates to a process for imaging deep ultraviolet (uv) photoresists with a topcoat using deep uv immersion lithography. The invention further relates to a topcoat composition comprising a polymer with at least one ionizable group having a pKranging from about −9 to about 11. The invention also relates to a process for imaging a photoresist with a top barrier coat to prevent contamination of the photoresist from environmental contaminants.