The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2010
Filed:
Jan. 24, 2006
David J. Abdallah, Bernardsville, NJ (US);
Mark O. Neisser, Whitehouse Station, NJ (US);
Ralph R. Dammel, Flemington, NJ (US);
Georg Pawlowski, Bridgewater, NJ (US);
John Biafore, North Sciatuate, RI (US);
Andrew R. Romano, Pittstown, NJ (US);
David J. Abdallah, Bernardsville, NJ (US);
Mark O. Neisser, Whitehouse Station, NJ (US);
Ralph R. Dammel, Flemington, NJ (US);
Georg Pawlowski, Bridgewater, NJ (US);
John Biafore, North Sciatuate, RI (US);
Andrew R. Romano, Pittstown, NJ (US);
AZ Electronic Materials USA Corp., Somerville, NJ (US);
Abstract
A process for imaging a photoresist comprising the steps of, a) forming a stack of multiple layers of organic antireflective coatings on a substrate; b) forming a coating of a photoresist over the upper layer of the stack of multiple layers of organic antireflective coatings; c) imagewise exposing the photoresist with an exposure equipment; and, d) developing the coating with a developer.