The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2011
Filed:
Apr. 09, 2007
Muthiah Thiyagarajan, Bridgewater, NJ (US);
Ralph R. Dammel, Flemington, NJ (US);
Yi Cao, Bedminster, NJ (US);
Sungeun Hong, Bedminster, NJ (US);
Wenbing Kang, Kakegawa, JP;
Clement Anyadiegwu, Parlin, NJ (US);
Muthiah Thiyagarajan, Bridgewater, NJ (US);
Ralph R. Dammel, Flemington, NJ (US);
Yi Cao, Bedminster, NJ (US);
SungEun Hong, Bedminster, NJ (US);
WenBing Kang, Kakegawa, JP;
Clement Anyadiegwu, Parlin, NJ (US);
AZ Electronic Materials USA Corp., Somerville, NJ (US);
Abstract
The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1) where Ris independently selected hydrogen, C-Calkyl, C-Calkyl alcohol, hydroxy (OH), amine (NH), carboxylic acid, and amide (CONH), represents the attachment to the polymer, m=1-6, and n=1-4. The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.