The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2009
Filed:
Nov. 22, 2004
Francis M. Houlihan, Millington, NJ (US);
Ralph R. Dammel, Flemington, NJ (US);
Andrew R. Romano, Pittstown, NJ (US);
Munirathna Padmanaban, Bridgewater, NJ (US);
M. Dalil Rahman, Flemington, NJ (US);
Francis M. Houlihan, Millington, NJ (US);
Ralph R. Dammel, Flemington, NJ (US);
Andrew R. Romano, Pittstown, NJ (US);
Munirathna Padmanaban, Bridgewater, NJ (US);
M. Dalil Rahman, Flemington, NJ (US);
AZ Electronic Materials USA Corp., Somerville, NJ (US);
Abstract
The present invention relates to a novel chemically amplified photoresist, which is sensitive to wavelengths between 300 nm and 100 nm, and comprises a) a novel polymer comprising a sulfone group pendant from a polymer backbone that is insoluble in an aqueous alkaline solution and comprises at least one acidic moiety protected with acid labile group, and b) a compound capable of producing an acid upon irradiation. The invention also relates to a process of imaging the novel positive photoresist composition.