The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2010
Filed:
Jun. 18, 2008
Muthiah Thiyagarajan, Bridgewater, NJ (US);
Yi Cao, Clinton, NJ (US);
Sung Eun Hong, Basking Ridge, NJ (US);
Ralph R. Dammel, Flemington, NJ (US);
Muthiah Thiyagarajan, Bridgewater, NJ (US);
Yi Cao, Clinton, NJ (US);
Sung Eun Hong, Basking Ridge, NJ (US);
Ralph R. Dammel, Flemington, NJ (US);
AZ Electronic Materials USA Corp., Somerville, NJ (US);
Abstract
The present invention relates to an aqueous coating composition for coating a photoresist pattern, comprising a polymer comprising at least one unit with an alkylamino group, where the unit has a structure (1), where, Rto Rare independently selected from hydrogen and Cto Calkyl, and W is Cto Calkyl. The invention also relates to a process for imaging a photoresist layer using the present composition.