Company Filing History:
Years Active: 2013-2014
Title: The Innovative Contributions of Tomonori Ishikawa
Introduction
Tomonori Ishikawa, an accomplished inventor based in Kakegawa, Japan, has made significant strides in the field of fine pattern formation technology. With a total of two patents to his name, his work focuses on creating advanced materials and methods for the accurate and efficient production of superfine patterns.
Latest Patents
Ishikawa's most recent patents include a "Silicon-containing composition for fine pattern formation and method for fine pattern formation using the same." This invention offers a composition designed for forming fine patterns with high dry etching resistance, incorporating a resin with a silazane bond and a solvent. The innovative method he developed allows for forming precise patterns that outperform conventional techniques.
Another notable patent is the "Superfine-patterned mask, method for production thereof, and method employing the same for forming superfine-pattern." This method provides a streamlined approach to producing superfine patterns with high mass productivity. It involves forming a first convex pattern on a substrate, then creating a silazane-containing resin spacer on the convexes to enable superior pattern formation.
Career Highlights
Tomonori Ishikawa currently works at Az Electronic Materials USA Corp., where he leverages his expertise to contribute to groundbreaking advancements in material science and nanotechnology. His commitment to innovation and excellence has helped solidify his position as a key figure in his field.
Collaborations
Throughout his career, Ishikawa has collaborated with notable coworkers, including Ralph R. Dammel and Wen-Bing Kang. These partnerships have fostered a creative environment that promotes the exchange of ideas and leads to further innovations in the area of fine pattern formation.
Conclusion
Tomonori Ishikawa's work exemplifies the spirit of innovation and the pursuit of excellence in the realm of fine patterning technologies. His patents demonstrate significant advancements that enhance productivity and precision in the production of superfine patterns. As technology continues to evolve, Ishikawa's contributions will undoubtedly play a vital role in shaping the future of this field.