The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2013

Filed:

Jun. 21, 2011
Applicants:

Huirong Yao, Plainsboro, NJ (US);

Guanyang Lin, Whitehouse Station, NJ (US);

Zachary Bogusz, Belmar, NJ (US);

Pinghung LU, Bridgewater, NJ (US);

Wookyu Kim, Bridgewater, NJ (US);

Mark Neisser, Whitehouse Station, NJ (US);

Inventors:

Huirong Yao, Plainsboro, NJ (US);

Guanyang Lin, Whitehouse Station, NJ (US);

Zachary Bogusz, Belmar, NJ (US);

PingHung Lu, Bridgewater, NJ (US);

WooKyu Kim, Bridgewater, NJ (US);

Mark Neisser, Whitehouse Station, NJ (US);

Assignee:

AZ Electronic Materials USA Corp., Somerville, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/00 (2006.01); C08K 5/04 (2006.01); C08K 5/00 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to an underlayer composition comprising a polymer, an organic titanate compound and optionally a thermal acid generator, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group. The invention also relates to a process for using this underlayer material as an antireflective coating composition and/or a hard mask for pattern transfer.


Find Patent Forward Citations

Loading…