The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2013
Filed:
Nov. 30, 2009
Applicants:
Wenbing Kang, Kakegawa, JP;
Xiaowei Wang, Kakegawa, JP;
Yuriko Matsuura, Kakegawa, JP;
Inventors:
Assignee:
AZ Electronic Materials USA Corp., Somerville, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention provides a pattern formation method capable of preventing formation of surface defects. In the method, a resist surface after subjected to exposure is coated with an acidic film and then subjected to heating treatment. This method is suitably adopted in a process employing liquid immersion lithography and/or light of short wavelength, such as ArF excimer laser beams, for producing a very fine pattern.