Xiaowei Wang

This inventor holds 10 USPTO granted patents and 2 published patent applications and 1 EPO patent. Top assignees: Az Electronic Materials (Luxembourg) S.a.r.l., Merck Patent Gmbh, Az Electronic Material (Luxembourg) S.ár.l.. Active years: 2013-2022.

USPTO Granted Patents = 10 (Patent Applications = 2)

% Patents Active = 50.0

EPO Patents = 1

Average Co-Inventor Count = 2.5

ph-index = 1

Forward Citations = 5(Granted Patents)

Location History:

Shizouka, JP (2016)
Shizuoka, JP (2016 - 2017)
Kakegawa, JP (2013 - 2020)
Iwata, JP (2020 - 2022)

Company Filing History:

5 out of 76

Az Electronic Materials (Luxembourg) S.a.r.l.

Az Electronic Material (Luxembourg) S.ár.l.

patent

4. 1 out of 115

Az Electronic Materials USA Corp.

patents

5. 1 out of 132,108

Samsung Electronics Co., Ltd.

patents

where one patent can have more than one assignee

Years Active: 2013-2022

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10 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11392035 - Gap filling composition and pattern forming method using composition containing polymer (2022-07-19),

2. 11169443 - Gap filling composition and pattern forming method using low molecular weight compound (2021-11-09),

3. 10670969 - Reverse pattern formation composition, reverse pattern formation method, and device formation method (2020-06-02),

4. 10656522 - Composition for forming fine resist pattern and pattern forming method using same (2020-05-19),

5. 10268117 - Top-layer membrane formation composition and method for forming resist pattern using same (2019-04-23),

6. 9810988 - Composition for forming overlay film, and resist pattern formation method employing the same (2017-11-07),

7. 9804493 - Composition for forming topcoat layer and resist pattern formation method employing the same (2017-10-31),

8. 9482952 - Composition for forming topcoat layer and resist pattern formation method employing the same (2016-11-01),

9. 9298095 - Rinse solution for lithography and pattern formation method employing the same (2016-03-29),

10. 8618002 - Resist pattern formating method (2013-12-31),

Title: Innovations of Xiaowei Wang

Introduction

Xiaowei Wang is a prominent inventor based in Kakegawa, Japan. He has made significant contributions to the field of materials science, particularly in the development of gap filling compositions and pattern forming methods. With a total of 10 patents to his name, Wang's work has had a substantial impact on various industries.

Latest Patents

Wang's latest patents include a gap filling composition and a pattern forming method using a composition containing a polymer. This invention provides a gap filling composition that can reduce pattern collapse, along with a method for forming patterns using this composition. Additionally, he has developed a gap filling composition that includes a low molecular weight compound, which also aims to reduce pattern collapse. This composition consists of a gap filling compound, an organic solvent, and, if necessary, water. The gap filling compound has a specific structure and contains hydroxyl groups, carboxyl groups, or amino groups intramolecularly.

Career Highlights

Throughout his career, Xiaowei Wang has worked with notable companies such as Az Electronic Materials and Merck Patent GmbH. His experience in these organizations has allowed him to refine his expertise in materials and patent development.

Collaborations

Wang has collaborated with esteemed colleagues, including Georg Pawlowski and Tetsuo Okayasu. These partnerships have contributed to the advancement of his innovative projects.

Conclusion

Xiaowei Wang's contributions to the field of materials science through his patents and collaborations highlight his role as a leading inventor. His work continues to influence advancements in technology and materials.