The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 01, 2016

Filed:

Mar. 14, 2014
Applicant:

AZ Electronic Materials (Luxembourg) S.a.r.l., Somerville, NJ (US);

Inventors:

Xiaowei Wang, Shizouka, JP;

Tetsuo Okayasu, Shizuoka, JP;

Georg Pawlowski, Shizuoka, JP;

Takafumi Kinuta, Shizuoka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/09 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); C08G 63/133 (2006.01); C08F 20/10 (2006.01); C09D 4/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/091 (2013.01); C08F 20/10 (2013.01); C08G 63/133 (2013.01); C09D 4/00 (2013.01); G03F 7/11 (2013.01); G03F 7/20 (2013.01); G03F 7/322 (2013.01);
Abstract

To provide a composition for forming a topcoat layer enabling to produce a pattern excellent in roughness and in pattern shape, and also to provide a pattern formation method employing that. A composition for forming a topcoat layer, containing a solvent and a triphenylene derivative having a hydrophilic group; and also a method of forming a pattern by casting the above composition on a resist surface and then by subjecting it to exposure and development. The composition may further contain a polymer.


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