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For the Inventor, By the Inventor

Shizuoka, Japan

Georg Pawlowski

This inventor holds 15 USPTO granted patents and 1 published patent application, primarily in Lithography Materials. Top assignees: Clariant Finance (Bvi) Limited, Az Electronic Materials (Luxembourg) S.a.r.l., Clariant International Ltd. Active years: 2001-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Georg Pawlowski. Retrieved from https://idiyas.com/inventor/georg-pawlowski-3mvt9xz4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 15 

% Patents Active = 73.3

Average Co-Inventor Count = 4.5

ph-index = 6

Forward Citations = 177(Granted Patents)


Location History:

  • Shizuoka, JP (2001 - 2017)
  • Kakegawa, JP (2017)
  • Tokyo, JP (2019)

Company Filing History:

goldMedal6 out of 507 
 
Clariant Finance (Bvi) Limited
 patents
silverMedal4 out of 76 
 
Az Electronic Materials (Luxembourg) S.a.r.l.
 patents
bronzeMedal2 out of 280 
 
Clariant International Ltd
 patents
4. 2 out of 3,031 
 
Merck Patent Gmbh
 patents
5. 1 out of 1 
 
Az Electronic Material (Luxembourg) S.ár.l.
 patent
6. 1 out of 138,671 
 
Samsung Electronics Co., Ltd.
 patents
where one patent can have more than one assignee

Years Active: 2001-2019

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Areas of Expertise:
Top-layer Membrane
Resist Pattern
Overlay Film
Aromatic Imide
Fine Pattern Formation
Rinse Solution
Anti-reflective Coating
Radiation Absorbing Polymer
Chemical Amplification
Bottom Reflection Preventive Film
Polymeric Dye
15 patents (USPTO):Explore Patents
1. 10268117 - Top-layer membrane formation composition and method for forming resist pattern using same (2019-04-23),
2. 9810988 - Composition for forming overlay film, and resist pattern formation method employing the same (2017-11-07),
3. 9804493 - Composition for forming topcoat layer and resist pattern formation method employing the same (2017-10-31),
4. 9505721 - Aromatic imide compound and method for producing same (2016-11-29),
5. 9482952 - Composition for forming topcoat layer and resist pattern formation method employing the same (2016-11-01),
6. 9298095 - Rinse solution for lithography and pattern formation method employing the same (2016-03-29),
7. 9298094 - Composition for forming fine pattern and method for forming fined pattern using same (2016-03-29),
8. 6803168 - Composition for anti-reflective coating or radiation absorbing coating and compounds used in the composition (2004-10-12),
9. 6737492 - Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating (2004-05-18),
10. 6686121 - Process for preparing resists (2004-02-03),
11. 6468718 - Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating (2002-10-22),
12. 6358665 - Radiation-sensitive composition of chemical amplification type (2002-03-19),
13. 6329117 - Antireflection or light-absorbing coating composition and polymer therefor (2001-12-11),
14. 6284427 - Process for preparing resists (2001-09-04),
15. 6277750 - Composition for bottom reflection preventive film and novel polymeric dye for use in the same (2001-08-21),

Title: The Innovative Journey of Georg Pawlowski

Introduction: Georg Pawlowski is a visionary inventor based in Shizuoka, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Georg Pawlowski's recent patents include cutting-edge advancements in robotics, artificial intelligence, and sustainable energy solutions, solidifying his reputation as a pioneer in the industry.

Career Highlights: With a career spanning over two decades, Georg Pawlowski has held key positions in leading tech companies, where he spearheaded research and development projects that have led to significant technological breakthroughs.

Collaborations: Throughout his career, Georg Pawlowski has collaborated with top researchers, engineers, and scientists from around the world, fostering a culture of innovation and excellence in all his projects.

Conclusion: Georg Pawlowski's relentless pursuit of innovation and his passion for pushing the boundaries of technology continue to inspire the next generation of inventors and shape the future of technological advancements globally.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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