The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2001
Filed:
Jun. 27, 2000
Applicant:
Inventors:
Georg Pawlowski, Shizuoka, JP;
Munirathna Padmanaban, Somerville, NJ (US);
Wen-Bing Kang, Shizuoka, JP;
Hatsuyuki Tanaka, Shizuoka, JP;
Ken Kimura, Shizuoka, JP;
Yoshinori Nishiwaki, Shizuoka, JP;
Assignee:
Clariant Finance (BVI) Limited, Tortola, VG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/100 ;
U.S. Cl.
CPC ...
H01L 2/100 ;
Abstract
As a bottom anti-reflective coating material for use in photolithography, polymer dyes represented by following general formula are used. The polymer dyes are able to form a bottom anti-reflective coating having good film formation properties, good absorption properties at exposure wavelength, good step coverage, non-intermixing with photoresist and high etch rate.