Location History:
- Shizuoka., JP (2001)
- Ogasa-gun, JP (2002)
- Kakegawa, JP (2006)
- Shizuoka, JP (1998 - 2007)
Company Filing History:
10 out of 507 
3 out of 115 
2 out of 266 
Years Active: 1998-2007
Title: Innovations of Hatsuyuki Tanaka
Introduction
Hatsuyuki Tanaka is a prominent inventor based in Shizuoka, Japan. He has made significant contributions to the field of materials science and photolithography, holding a total of 18 patents. His work focuses on developing processes and materials that enhance the performance and reliability of photoresist coatings.
Latest Patents
Tanaka's latest patents include a development defect preventing process and material. This invention involves a composition for reducing development defects, which comprises an acidic composition containing a surfactant applied onto a chemically amplified photoresist coating formed on a substrate with a diameter of 8 inches or more. By utilizing this process, the surface of the resist is rendered hydrophilic, preventing the formation of a slightly soluble layer in a developer on the surface of the resist. Additionally, the proper diffusion of acid from the composition increases the reduction in thickness of the chemically amplified photoresist coating after development by 10 μm to 500 μm, resulting in a resist pattern that maintains a well-defined profile.
Another notable patent is an etching method and composition for forming an etching protective layer. This invention improves the etching resistance of the etching mask during the etching process. It involves forming a pattern on a substrate using photoresist, applying a composition for forming an etching protection layer, and treating the substrate by etching with the photoresist pattern as a mask. This method enhances the reliability and precision of the etching process.
Career Highlights
Throughout his career, Tanaka has worked with several notable companies, including Clariant Finance (BVI) Limited and Az Electronic Materials USA Corp. His experience in these organizations has contributed to his expertise in materials science and photolithography.
Collaborations
Tanaka has collaborated with several professionals in his field, including Ken Kimura and Wen-Bing Kang. These collaborations have further enriched his research and development efforts.
Conclusion
Hatsuyuki Tanaka's innovative contributions to materials science and photolithography have significantly advanced the field. His patents reflect a commitment to improving the performance and reliability of photoresist coatings, making him a notable figure in the world of inventions.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.