The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2005
Filed:
Aug. 30, 2002
Wen-bing Kang, Shizuoka, JP;
Ken Kimura, Shizuoka, JP;
Shoko Matsuo, Shizuoka, JP;
Yoshinori Nishiwaki, Shizuoka, JP;
Hatsuyuki Tanaka, Shizuoka, JP;
Wen-Bing Kang, Shizuoka, JP;
Ken Kimura, Shizuoka, JP;
Shoko Matsuo, Shizuoka, JP;
Yoshinori Nishiwaki, Shizuoka, JP;
Hatsuyuki Tanaka, Shizuoka, JP;
Clariant Finance (BVI) Limited, Tortola, VG;
Abstract
A composition for forming a radiation absorbing coating which comprises an organic solvent, a radiation absorbing polymer or a radiation absorbing material dissolved therein and a crosslinking agent having blocked isocyanate groups. Since the isocyanate groups of the crosslinking agent have been blocked, the composition containing the crosslinking agent has excellent storage stability. When the composition applied to a substrate and then baked, crosslinking proceeds to give an antireflective coating, which does not intermix with a resist layer to be formed thereon by coating and is free from diffusion of a photo-generated acid thereinto from the resist layer. As a result, a resist image free from footing or scum can be formed.