The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2017
Filed:
Nov. 21, 2014
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Hyun-woo Kim, Seongnam-si, KR;
Cheol hong Park, Seoul, KR;
Tetsuo Okayasu, Kakegawa, JP;
Xiaowei Wang, Kakegawa, JP;
Georg Pawlowski, Kakegawa, JP;
Yusuke Hama, Kakegawa, JP;
Samsung Electronics Co., LTD., Suwon-Si, Gyeonggi-do, KR;
AZ Electronics Materials (Luxembourg) S.A.R.L., Luxembourg, LU;
Abstract
Provided is a composition for forming a topcoat layer, the composition including a graphene derivative including a hydrophilic group; and a solvent. Also provided is a pattern formation method, including disposing a resist composition on a substrate, to form a resist layer; coating the resist layer with a composition including a graphene derivative including a hydrophilic group, and a solvent; heating the composition to harden the composition; subjecting the resist layer to exposure using extreme ultraviolet light; and developing exposed resist layer with an alkali aqueous solution.