This inventor holds 4 USPTO granted patents. Top assignees: Samsung Electronics Co., Ltd., Az Electronic Materials (Luxembourg) S.a.r.l., Samsung Electronics Ltd.. Active years: 2017-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
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1 out of 6,542 Years Active: 2017-2026
Title: Cheol Hong Park: Innovator in Photoresist Technology
Introduction
Cheol Hong Park is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of photoresist technology, particularly in the context of extreme ultraviolet (EUV) lithography. With a total of 4 patents, his work has been instrumental in advancing the capabilities of semiconductor manufacturing.
Latest Patents
One of his latest patents is a photoresist composition for extreme ultraviolet and a method of forming a photoresist pattern using the same. The disclosed embodiments provide a photoresist composition that includes an out-of-band (OOB) absorbing material, which absorbs light of a wavelength between 100 nm to 300 nm. Another notable patent is for a composition for forming a topcoat layer and a resist pattern formation method employing the same. This composition includes a graphene derivative with a hydrophilic group and a solvent. The pattern formation method involves several steps, including disposing a resist composition on a substrate, coating the resist layer with the topcoat composition, heating to harden, exposing the resist layer to extreme ultraviolet light, and developing the exposed resist layer with an alkali aqueous solution.
Career Highlights
Cheol Hong Park has worked with leading companies in the electronics industry, including Samsung Electronics Co., Ltd. and Az Electronics Materials (Luxembourg) S.a.r.l. His experience in these organizations has allowed him to refine his expertise in photoresist technology and contribute to innovative solutions in the field.
Collaborations
Throughout his career, Cheol Hong Park has collaborated with talented individuals such as Chawon Koh and Hyunwoo Kim. These collaborations have fostered a creative environment that has led to the development of cutting-edge technologies.
Conclusion
Cheol Hong Park's contributions to photoresist technology and his innovative patents highlight his role as a key figure in the semiconductor industry. His work continues to influence advancements in manufacturing processes, ensuring the ongoing evolution of technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile