The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2016
Filed:
Mar. 22, 2012
Applicants:
Xiaowei Wang, Shizuoka, JP;
Georg Pawlowski, Shizuoka, JP;
Yuriko Matsuura, Shizuoka, JP;
Inventors:
Assignee:
MERCK PATENT GMBH, Darmstadt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/40 (2006.01); G03F 7/20 (2006.01); G03F 7/00 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/40 (2013.01); G03F 7/0007 (2013.01); G03F 7/2041 (2013.01); H01L 21/0206 (2013.01);
Abstract
The present invention provides a rinse solution for lithography and a pattern formation method using the solution. They can improve the pattern collapse, surface roughness and surface defects. The solution contains at least a sulfonic acid a nonionic surfactant having an alkyleneoxy group and water.