The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2016
Filed:
Jul. 13, 2012
Applicants:
Toshira Okamura, Shizuoka, JP;
Georg Pawlowski, Shizuoka, JP;
Masahiro Ishii, Shizuoka, JP;
Inventors:
Assignee:
MERCK PATENT GMBH, Darmstadt, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 226/02 (2006.01); G03F 7/32 (2006.01); H01L 21/027 (2006.01); G03F 7/40 (2006.01); C09D 139/00 (2006.01); C08F 226/04 (2006.01); C08F 8/28 (2006.01); C08F 8/30 (2006.01); C08F 8/34 (2006.01);
U.S. Cl.
CPC ...
G03F 7/32 (2013.01); C08F 8/28 (2013.01); C08F 8/30 (2013.01); C08F 8/34 (2013.01); C08F 226/02 (2013.01); C08F 226/04 (2013.01); C09D 139/00 (2013.01); G03F 7/405 (2013.01); H01L 21/0273 (2013.01); C08F 2800/10 (2013.01); C08F 2810/30 (2013.01); C08F 2810/50 (2013.01); Y10T 428/24802 (2015.01);
Abstract
The present invention provides a resist pattern-forming composition capable of forming a resist pattern excellent in etching resistance. The invention also provides a resist pattern formation method using that composition. The composition comprises pure water and a water-soluble resin having aromatic group-containing substituents in its side chain. The composition also contains a free acid or an acid group combined with the water-soluble resin.