The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 07, 2017

Filed:

Dec. 12, 2013
Applicant:

AZ Electronic Materials (Luxembourg) S.a.r.l., Somerville, NJ (US);

Inventors:

Xiaowei Wang, Shizuoka, JP;

Masato Suzuki, Shizuoka, JP;

Tetsuo Okayasu, Shizuoka, JP;

Georg Pawlowski, Shizuoka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/11 (2006.01); C09D 1/00 (2006.01); C09D 125/06 (2006.01); C09D 129/04 (2006.01); C09D 133/02 (2006.01); C09D 165/00 (2006.01); G03F 7/09 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2002 (2013.01); C09D 1/00 (2013.01); C09D 125/06 (2013.01); C09D 129/04 (2013.01); C09D 133/02 (2013.01); C09D 165/00 (2013.01); G03F 7/091 (2013.01); G03F 7/11 (2013.01);
Abstract

The objective of this invention is to provide a composition for forming a topcoat layer enabling to produce a pattern excellent in roughness and in pattern shape; and also to provide a pattern formation method employing that composition is described. The means for solving this objective is a composition for forming a topcoat layer, comprising a solvent and a fullerene derivative having a hydrophilic group; and also a method of forming a pattern by casting the above composition on a resist surface and then by subjecting it to exposure and development.


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