The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2020
Filed:
Nov. 02, 2016
Applicant:
AZ Electronic Materials (Luxembourg) S.a.r.l., Luxembourg, LU;
Inventor:
Xiaowei Wang, Kakegawa, JP;
Assignee:
AZ Electronic Materials (Luxembourg) S.a.r.l., Luxembourg, LU;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/40 (2006.01); C09D 139/04 (2006.01); C09D 139/08 (2006.01); G03F 7/038 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C09D 139/04 (2013.01); C09D 139/08 (2013.01); G03F 7/038 (2013.01); G03F 7/16 (2013.01); G03F 7/168 (2013.01); G03F 7/405 (2013.01); C08L 2201/56 (2013.01);
Abstract
The present invention relates to a shrink material composition for fattening a resist pattern prepared from a negative-tone lithography process, comprising at least one polymer and at least one organic solvent, wherein the at least one polymer comprises at least one structural unit of a nitrogen heteroaromatic ring system.