The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2020
Filed:
Jul. 03, 2017
Reverse pattern formation composition, reverse pattern formation method, and device formation method
Applicant:
Merck Patent Gmbh, Darmstadt, DE;
Inventors:
Xiaowei Wang, Iwata, JP;
Tatsuro Nagahara, Kakegawa, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/36 (2006.01); G03F 7/075 (2006.01); G03F 7/40 (2006.01); C09D 183/04 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/36 (2013.01); C09D 183/04 (2013.01); G03F 7/0757 (2013.01); G03F 7/40 (2013.01); G03F 7/16 (2013.01);
Abstract
[Problem] To provide a composition, which is a reverse pattern formation composition comprising an aqueous solvent having little influence on a resist pattern, and which is excellent in flatness and filling properties after coating and has excellent etching resistance. Furthermore, a method for forming a pattern using the same is provided. [Means for Solution] A reverse pattern formation composition comprising a polysiloxane compound comprising a repeating unit having a nitrogen-containing group and a solvent comprising water, and a method for forming a fine pattern using the same.