Kakegawa, Japan

Yusuke Takano


 

Average Co-Inventor Count = 3.2

ph-index = 5

Forward Citations = 73(Granted Patents)


Location History:

  • Ogasa-gun, JP (2008)
  • Kakegawa, JP (2006 - 2013)
  • Shizuoka, JP (2001 - 2014)

Company Filing History:


Years Active: 2001-2014

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15 patents (USPTO):Explore Patents

Title: Yusuke Takano: Innovator in Superfine Pattern Technology

Introduction

Yusuke Takano is a prominent inventor based in Kakegawa, Japan. He has made significant contributions to the field of superfine pattern technology, holding a total of 15 patents. His innovative work focuses on compositions and methods that enhance the production of superfine patterns, which are crucial in various technological applications.

Latest Patents

Among his latest patents, Takano has developed a "Superfine pattern mask, method for production thereof, and method employing the same for forming superfine pattern." This invention provides a composition for forming a superfine pattern that allows for simple production with high mass productivity. The composition includes perhydropolysilazane, a silicon-containing polymer with a hydrocarbon group, and a solvent. The mixture is designed to contain silicon-hydrogen bonds and silicon-hydrocarbon group bonds in a specific ratio, enabling effective application on resist patterns to create spacers for superfine pattern formation.

Another notable patent is the "Composition for formation of top antireflective film, and pattern formation method using the composition." This composition comprises at least one fluorine-containing compound and a quaternary ammonium compound, which can achieve the same functionality as conventional top antireflective film-forming compositions while using a smaller amount.

Career Highlights

Throughout his career, Yusuke Takano has worked with various companies, including Az Electronic Materials USA Corp. His experience in these organizations has contributed to his expertise in the field of superfine pattern technology.

Collaborations

Takano has collaborated with notable coworkers such as Hatsuyuki Tanaka and Yasushi Akiyama. Their joint efforts have further advanced the innovations in the technologies they have worked on.

Conclusion

Yusuke Takano's contributions to superfine pattern technology through his patents and collaborations highlight his role as a leading inventor in this field. His work continues to influence advancements in technology and manufacturing processes.

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