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Kakegawa, Japan

Yusuke Takano

USPTO Granted Patents = 15

EPO Patents = 1 (Patent Applications = 1)

Average Co-Inventor Count = 3.2

ph-index = 5

Forward Citations = 73(Granted Patents)

Location History:

Ogasa-gun, JP (2008)
Kakegawa, JP (2006 - 2013)
Shizuoka, JP (2001 - 2014)

Company Filing History:

Az Electronic Materials USA Corp.

Clariant Finance (bvi) Limited

Dainippon Ink and Chemicals, Incorporated

Az Electronic Materials (japan) K.k.

Electronic Materials USA Corp.

6. 1 out of 832,680

Other

patents

where one patent can have more than one assignee

Years Active: 2001-2014

where 'Filed Patents' based on already Granted Patents

15 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 8796398 - Superfine pattern mask, method for production thereof, and method employing the same for forming superfine pattern (2014-08-05),

2. 8568955 - Composition for formation of top antireflective film, and pattern formation method using the composition (2013-10-29),

3. 8501394 - Superfine-patterned mask, method for production thereof, and method employing the same for forming superfine-pattern (2013-08-06),

4. 8084186 - Hardmask process for forming a reverse tone image using polysilazane (2011-12-27),

5. 7799513 - Process for preventing development defect and composition for use in the same (2010-09-21),

6. 7745093 - Water soluble resin composition and method for pattern formation using the same (2010-06-29),

7. 7592132 - Method for fine pattern formation (2009-09-22),

8. 7537882 - Anti-reflective coating composition and production method for pattern using the same (2009-05-26),

9. 7399582 - Material for forming fine pattern and method for forming fine pattern using the same (2008-07-15),

10. 7365115 - Composition for antireflection coating and method for forming pattern (2008-04-29),

11. 7335464 - Water soluble resin composition, method of pattern formation and method of inspecting resist pattern (2008-02-26),

12. 7195863 - Development defect preventing process and material (2007-03-27),

13. 7018785 - Method for forming pattern and treating agent for use therein (2006-03-28),

14. 6692892 - Composition for antireflection coating (2004-02-17),

15. 6309789 - Composition for reflection reducing coating (2001-10-30),

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