The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2014
Filed:
Dec. 15, 2011
Shigemasa Nakasugi, Kakegawa, JP;
Kazuma Yamamoto, Kakegawa, JP;
Yasushi Akiyama, Kakegawa, JP;
Shinji Miyazaki, Kakegawa, JP;
Munirathna Padmanaban, Bridgewater, NJ (US);
Srinivasan Chakrapani, Bridgewater, NJ (US);
Shigemasa Nakasugi, Kakegawa, JP;
Kazuma Yamamoto, Kakegawa, JP;
Yasushi Akiyama, Kakegawa, JP;
Shinji Miyazaki, Kakegawa, JP;
Munirathna Padmanaban, Bridgewater, NJ (US);
Srinivasan Chakrapani, Bridgewater, NJ (US);
AZ Electronic Materials USA Corp., Somerville, NJ (US);
Abstract
The present invention provides a composition for forming a bottom anti-reflective coating, and also provides a photoresist pattern formation method employing that composition. The composition gives a bottom anti-reflective coating used in a lithographic process for manufacturing semiconductor devices, and the coating can be developed with a developing solution for photoresist. The composition contains a solvent, a polymer having a condensed polycyclic aromatic group, and a compound having a maleimide derivative or a maleic anhydride derivative. The composition may further contain a photo acid generator or a crosslinking agent.