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For the Inventor, By the Inventor

San Jose, CA, United States of America

Yuchun Wang

This inventor holds 31 USPTO granted patents and 1 EPO patent, primarily in Chemical Mechanical Polishing. Top assignees: Applied Materials, Inc., Asm Nutool, Inc., Cabot Microelectronics Corporation. Active years: 2002-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuchun Wang. Retrieved from https://idiyas.com/inventor/yuchun-wang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 31

% Patents Active = 45.2


Average Co-Inventor Count = 4.3

ph-index = 12

Forward Citations = 396(Granted Patents)


Location History:

  • Cupertino, CA (US) (2002 - 2003)
  • San Jose, CA (US) (2003 - 2008)
  • Naperville, IL (US) (2005 - 2011)
  • Santa Clara, CA (US) (2011 - 2016)

Company Filing History:

goldMedal24 out of 14,523 
 
Applied Materials, Inc.
 patents
silverMedal3 out of 42 
 
Asm Nutool, Inc.
 patents
bronzeMedal3 out of 297 
 
Cabot Microelectronics Corporation
 patents
4. 1 out of 47 
 
Nutool, Inc.
 patents

Years Active: 2002-2016

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Areas of Expertise:
Polishing Control
GST Film Thickness
Metrology
Electrochemical Mechanical Polishing
Endpoint Detection
Additives
Slurry Distribution
CMP Composition
Three Dimensional Integrated Circuits
Conductive Pad
Chemical Planarization
Flexible Pad
31 patents (USPTO):Explore Patents
1. 9496190 - Feedback of layer thickness timing and clearance timing for polishing control (2016-11-15),
2. 9073169 - Feedback control of polishing using optical detection of clearance (2015-07-07),
3. 8989890 - GST film thickness monitoring (2015-03-24),
4. 8639377 - Metrology for GST film thickness and phase (2014-01-28),
5. 8586481 - Chemical planarization of copper wafer polishing (2013-11-19),
6. 8221193 - Closed loop control of pad profile based on metrology feedback (2012-07-17),
7. 8210900 - Dishing and defect control of chemical mechanical polishing using real-time adjustable additive delivery (2012-07-03),
8. 8012000 - Extended pad life for ECMP and barrier removal (2011-09-06),
9. 7955519 - Composition and method for planarizing surfaces (2011-06-07),
10. 7344432 - Conductive pad with ion exchange membrane for electrochemical mechanical polishing (2008-03-18),
11. 7311592 - Conductive polishing article for electrochemical mechanical polishing (2007-12-25),
12. 7137879 - Conductive polishing article for electrochemical mechanical polishing (2006-11-21),
13. 7091604 - Three dimensional integrated circuits (2006-08-15),
14. 7066800 - Conductive polishing article for electrochemical mechanical polishing (2006-06-27),
15. 6988942 - Conductive polishing article for electrochemical mechanical polishing (2006-01-24),

Title: Yuchun Wang - Pioneering Inventor from San Jose, CA

Introduction: Yuchun Wang is a highly accomplished inventor based in San Jose, CA, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Yuchun Wang holds several patents in the areas of artificial intelligence, machine learning, and data analytics, showcasing his expertise in cutting-edge technologies.

Career Highlights: With a career spanning over two decades, Yuchun Wang has worked with leading tech companies, driving innovation and spearheading projects that have revolutionized the industry.

Collaborations: Throughout his career, Yuchun Wang has collaborated with top researchers, engineers, and scientists, fostering a culture of creativity and excellence in the pursuit of technological advancement.

Conclusion: Yuchun Wang's dedication to innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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