The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2015
Filed:
Jan. 29, 2010
Kun Xu, Fremont, CA (US);
Feng Liu, San Jose, CA (US);
Dominic J. Benvegnu, La Honda, CA (US);
Boguslaw A. Swedek, Cupertino, CA (US);
Yuchun Wang, Santa Clara, CA (US);
Wen-chiang Tu, Mountain View, CA (US);
Laksh Karuppiah, San Jose, CA (US);
Kun Xu, Fremont, CA (US);
Feng Liu, San Jose, CA (US);
Dominic J. Benvegnu, La Honda, CA (US);
Boguslaw A. Swedek, Cupertino, CA (US);
Yuchun Wang, Santa Clara, CA (US);
Wen-Chiang Tu, Mountain View, CA (US);
Laksh Karuppiah, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
In polishing a substrate having a layer of GST disposed over an underlying layer, during polishing, a non-polarized light beam is directed onto the layer of GST. The non-polarized light beam reflects from the first substrate to generate a reflected light beam having an infra-red component. A sequence of measurements of intensity of the infra-red component of the reflected light beam are generated, and, in a processor, a time at which the sequence of measurements exhibits a predefined feature is determined.