Laksh Karuppiah

Title: Innovations by Laksh Karuppiah

Introduction

Laksh Karuppiah is an accomplished inventor based in San Jose, CA. He has made significant contributions to the field of polishing control technology, holding a total of 2 patents. His work focuses on enhancing the precision and efficiency of substrate polishing processes.

Latest Patents

Laksh's latest patents include innovative methods for monitoring layer thickness and clearance timing during polishing operations. The first patent, titled "Feedback of layer thickness timing and clearance timing for polishing control," describes a system that utilizes in-situ monitoring to determine the optimal polishing pressure for substrates. This method ensures that the underlying layer is exposed at the right time, improving the overall polishing process. The second patent, "GST film thickness monitoring," involves directing a non-polarized light beam onto a layer of GST during polishing. This technique allows for real-time monitoring of the film thickness, enhancing the accuracy of the polishing operation.

Career Highlights

Laksh Karuppiah is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display technology sectors. His work at Applied Materials has positioned him as a key player in advancing polishing technologies.

Collaborations

Laksh collaborates with talented coworkers, including Kun Xu and Feng Quan Liu. Their combined expertise contributes to the innovative solutions developed at Applied Materials.

Conclusion

Laksh Karuppiah's contributions to polishing control technology through his patents demonstrate his commitment to innovation in the field. His work continues to influence the industry and improve manufacturing processes.