The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2011

Filed:

Apr. 02, 2007
Applicants:

Yuchun Wang, Santa Clara, CA (US);

Robert A. Ewald, Aptos, CA (US);

Wei-yung Hsu, Santa Clara, CA (US);

Liang-yuh Chen, Foster City, CA (US);

Inventors:

Yuchun Wang, Santa Clara, CA (US);

Robert A. Ewald, Aptos, CA (US);

Wei-Yung Hsu, Santa Clara, CA (US);

Liang-Yuh Chen, Foster City, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24D 11/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and apparatus for extending a polishing article lifetime on a polishing tool with multiple platens is described. The apparatus includes an advanceable roll to roll platen with multiple embodiments of a polishing article to be used thereon. The polishing article is adapted to perform a polishing process by removing conductive and dielectric material from a substrate while minimizing downtime of the polishing tool. In some embodiments, the polishing article may be a dielectric material or a conductive material and is configured to include a longer usable lifetime to minimize replacement and downtime of the tool.


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