Company Filing History:
2 out of 13,684 
1 out of 7 Years Active: 2000-2011
Title: The Innovative Contributions of Robert A. Ewald
Introduction
Robert A. Ewald is a notable inventor based in Aptos, California. He has made significant contributions to the field of electrochemical mechanical polishing (ECMP) with a total of 3 patents to his name. His work focuses on enhancing the efficiency and longevity of polishing tools used in semiconductor manufacturing.
Latest Patents
One of Ewald's latest patents is titled "Extended Pad Life for ECMP and Barrier Removal." This invention describes a method and apparatus designed to extend the lifetime of polishing articles on tools with multiple platens. The apparatus features an advanceable roll-to-roll platen that accommodates various embodiments of polishing articles. These articles are engineered to remove conductive and dielectric materials from substrates while minimizing the downtime of the polishing tool. The design aims to provide a longer usable lifetime for the polishing articles, thereby reducing the frequency of replacements.
Another significant patent by Ewald is "Conductive Pad with Ion Exchange Membrane for Electrochemical Mechanical Polishing." This invention includes an article of manufacture and apparatus for processing substrate surfaces. It features a polishing article with a partially conductive polishing surface and an electrode positioned beneath it, separated by a dielectric material. The design incorporates a membrane that is permeable to ions and current, promoting continuity between the electrode and the polishing surface. This innovative approach enhances the effectiveness of the polishing process.
Career Highlights
Throughout his career, Robert A. Ewald has worked with several prominent companies in the semiconductor industry. He has been associated with Applied Materials, Inc., Silicon Valley Group, and Thermal Systems LLP. His experience in these organizations has contributed to his expertise in developing advanced polishing technologies.
Collaborations
Ewald has collaborated with notable professionals in his field, including Yuchun Wang and Lawrence Duane Bartholomew. These collaborations have likely enriched his work and led to innovative advancements in polishing technologies.
Conclusion
Robert A. Ewald's contributions to the field of electrochemical mechanical polishing are noteworthy. His innovative patents and extensive career in the semiconductor industry highlight his commitment to improving polishing processes. Ewald's work continues to influence the efficiency and effectiveness of semiconductor manufacturing.
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