Young Way Teh

This inventor holds 21 USPTO granted patents and 1 published patent application. Top assignees: Chartered Semiconductor Manufacturing Ltd (Corporation), International Business Machines Corporation, Globalfoundries Singapore Pte. Ltd.. Active years: 2007-2025.

USPTO Granted Patents = 21 (Patent Applications = 1)

% Patents Active = 42.9

Average Co-Inventor Count = 5.3

ph-index = 6

Forward Citations = 304(Granted Patents)

Location History:

Singapore, MY (2013)
Singapore, SG (2007 - 2014)
Wappingers Falls, NY (US) (2014)
Wappinger Falls, NY (US) (2014)

Company Filing History:

12 out of 962

Chartered Semiconductor Manufacturing Ltd (Corporation)

patents

8 out of 166,264

International Business Machines Corporation

patents

6 out of 1,055

Globalfoundries Singapore Pte. Ltd.

patents

4. 4 out of 132,108

Samsung Electronics Co., Ltd.

patents

5. 2 out of 5,491

Freescale Semiconductor,inc.

Infineon Technologies North America Corp.

patents

where one patent can have more than one assignee

Years Active: 2007-2025

Loading Chart...

21 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12266702 - Flash memory devices with thickened source/drain silicide (2025-04-01),

2. 8853796 - High-K metal gate device (2014-10-07),

3. 8664717 - Semiconductor device with an oversized local contact as a Faraday shield (2014-03-04),

4. 8624329 - Spacer-less low-K dielectric processes (2014-01-07),

5. 8563394 - Integrated circuit structure having substantially planar N-P step height and methods of forming (2013-10-22),

6. 8519445 - Poly profile engineering to modulate spacer induced stress for device enhancement (2013-08-27),

7. 8461009 - Spacer and process to enhance the strain in the channel with stress liner (2013-06-11),

8. 8106462 - Balancing NFET and PFET performance using straining layers (2012-01-31),

9. 7999325 - Method to remove spacer after salicidation to enhance contact etch stop liner stress on MOS (2011-08-16),

10. 7993997 - Poly profile engineering to modulate spacer induced stress for device enhancement (2011-08-09),

11. 7977185 - Method and apparatus for post silicide spacer removal (2011-07-12),

12. 7883953 - Method for transistor fabrication with optimized performance (2011-02-08),

13. 7867835 - Integrated circuit system for suppressing short channel effects (2011-01-11),

14. 7785950 - Dual stress memory technique method and related structure (2010-08-31),

15. 7759206 - Methods of forming semiconductor devices using embedded L-shape spacers (2010-07-20),

Title: Young Way Teh: Pioneering Inventor from Singapore

Introduction: Young Way Teh is a distinguished inventor hailing from Singapore, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Young Way Teh holds several patents in various technological domains, showcasing his continuous commitment to pushing the boundaries of innovation.

Career Highlights: Throughout his illustrious career, Young Way Teh has been instrumental in developing cutting-edge technologies that have revolutionized industries and improved the quality of life for many.

Collaborations: Young Way Teh has collaborated with leading research institutions, universities, and companies worldwide, fostering a culture of innovation and knowledge sharing.

Conclusion: Young Way Teh's passion for innovation and his relentless pursuit of excellence make him a true trailblazer in the world of inventions, inspiring the next generation of inventors to dream big and create a better future.