Yongan Xu

USPTO Granted Patents = 65 (Patent Applications = 4)

Average Co-Inventor Count = 3.9

ph-index = 8

Forward Citations = 178(Granted Patents)

Forward Citations (Not Self Cited) = 152(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Schenectady, NY (US) (2016 - 2018)
San Jose, CA (US) (2021 - 2023)
Albany, NY (US) (2015 - 2024)
Niskayuna, NY (US) (2016 - 2024)

Company Filing History:

57 out of 164,244

International Business Machines Corporation

Adeia Semiconductor Bonding Technologies Inc.

patents

4. 2 out of 2,874

Stmicroelectronics Gmbh

patents

where one patent can have more than one assignee

Years Active: 2015-2024

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Areas of Expertise:

Extreme Ultraviolet Lithography

Self-Aligned Double Patterning

Metal Via Structure

Wafer Freezing

Selective Gas Etching

Critical Dimension Control

Pattern Transfer

Damascene Interconnect

Electronic Devices

Vertical Transport Field Effect Transistors

Hard Mask Films

Subtractive Metal Processes

65 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12094774 - Back-end-of-line single damascene top via spacer defined by pillar mandrels (2024-09-17),

2. 12087601 - Reducing line edge roughness and mitigating defects by wafer freezing (2024-09-10),

3. 11978639 - Two-color self-aligned double patterning (SADP) to yield static random access memory (SRAM) and dense logic (2024-05-07),

4. 11784120 - Metal via structure (2023-10-10),

5. 11699591 - Two-color self-aligned double patterning (SADP) to yield static random access memory (SRAM) and dense logic (2023-07-11),

6. 11543793 - Developer critical dimension control with pulse development (2023-01-03),

7. 11501969 - Direct extreme ultraviolet lithography on hard mask with reverse tone (2022-11-15),

8. 11398409 - Method of forming a BEOL interconnect structure using a subtractive metal via first process (2022-07-26),

9. 11302571 - Cut integration for subtractive first metal line with bottom up second metal line (2022-04-12),

10. 11302533 - Selective gas etching for self-aligned pattern transfer (2022-04-12),

11. 11171001 - Multiple patterning scheme integration with planarized cut patterning (2021-11-09),

12. 11152298 - Metal via structure (2021-10-19),

13. 11131919 - Extreme ultraviolet (EUV) mask stack processing (2021-09-28),

14. 11069564 - Double metal patterning (2021-07-20),

15. 11062911 - Two-color self-aligned double patterning (SADP) to yield static random access memory (SRAM) and dense logic (2021-07-13),

Title: The Innovative Journey of Yongan Xu

Introduction: Yongan Xu, a talented inventor hailing from Niskayuna, NY, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Yongan Xu's latest patents showcase his ingenuity and forward-thinking approach to problem-solving in various industries, including telecommunications, renewable energy, and healthcare.

Career Highlights: With a career spanning over two decades, Yongan Xu has held key positions in leading research institutions and technology companies, where he has spearheaded projects that have resulted in cutting-edge inventions and patents.

Collaborations: Throughout his career, Yongan Xu has collaborated with top researchers, engineers, and scientists to bring his ideas to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many projects.

Conclusion: Yongan Xu's passion for innovation, coupled with his technical expertise, has established him as a respected figure in the world of inventors. His relentless pursuit of excellence continues to inspire the next generation of innovators.

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4 patents pending:

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