The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2024
Filed:
May. 08, 2019
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Karen E. Petrillo, Voorheesville, NY (US);
Jennifer Fullam, Clifton Park, NY (US);
Yongan Xu, Niskayuna, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67248 (2013.01); G03F 7/40 (2013.01); H01L 21/67098 (2013.01); H01L 21/67225 (2013.01);
Abstract
A photoresist is developed on a semiconductor wafer. The wafer is introduced into a controlled cold temperature environment and is maintained there until inelastic thermal contraction of the developed photoresist material results in reducing the critical dimension (CD) of the photoresist by not less than 10% from its value before exposure to the controlled cold temperature environment. Then the semiconductor wafer is removed from the controlled cold temperature environment.