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For the Inventor, By the Inventor

Voorheesville, NY, United States of America

Karen Elizabeth Petrillo

This inventor holds 32 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Lithography Techniques. Top assignees: International Business Machines Corporation, Shin-Etsu Chemical Co., Ltd.. Active years: 1997-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Karen Elizabeth Petrillo. Retrieved from https://idiyas.com/inventor/karen-elizabeth-petrillo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 32 

% Patents Active = 56.3

 

Average Co-Inventor Count = 5.2

ph-index = 7

Forward Citations = 150(Granted Patents)


Location History:

  • Mahopac, NY (US) (1997 - 2010)
  • Voorheesville, NY (US) (2009 - 2024)

Company Filing History:

goldMedal32 out of 166,425 
 
International Business Machines Corporation
 patents
silverMedal2 out of 5,989 
 
Shin-Etsu Chemical Co., Ltd.
 patents
where one patent can have more than one assignee

Years Active: 1997-2024

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Areas of Expertise:
Photoresist
Lithography
Wafer Processing
E-Beam
Extreme Ultraviolet
Microelectronic Substrate
Resist Systems
Polymer Compositions
Patterning Process
Edge Roughness
Contamination Gettering
Sensitivity Enhancement
32 patents (USPTO):Explore Patents
1. 12087601 - Reducing line edge roughness and mitigating defects by wafer freezing (2024-09-10),
2. 11688636 - Spin on scaffold film for forming topvia (2023-06-27),
3. 11067896 - Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delay (2021-07-20),
4. 11022891 - Photoresist bridging defect removal by reverse tone weak developer (2021-06-01),
5. 11022890 - Photoresist bridging defect removal by reverse tone weak developer (2021-06-01),
6. 10545409 - Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delay (2020-01-28),
7. 10514605 - Resist multilayer film-attached substrate and patterning process (2019-12-24),
8. 10254652 - Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning (2019-04-09),
9. 10082736 - Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning (2018-09-25),
10. 9580623 - Patterning process using a boron phosphorus silicon glass film (2017-02-28),
11. 8946866 - Microelectronic substrate having removable edge extension element (2015-02-03),
12. 8202460 - Microelectronic substrate having removable edge extension element (2012-06-19),
13. 7960095 - Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates (2011-06-14),
14. 7807335 - Immersion lithography contamination gettering layer (2010-10-05),
15. 7736833 - Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof (2010-06-15),

Title: Karen Elizabeth Petrillo: Pioneering Inventor from Voorheesville, NY

Introduction: Karen Elizabeth Petrillo is a trailblazing inventor hailing from Voorheesville, NY. With a passion for innovation and a drive to make a difference, she has made significant contributions to the field of technology.

Latest Patents: Karen Elizabeth Petrillo holds several patents in the areas of sustainable energy solutions and smart home technologies. Her most recent patents focus on enhancing energy efficiency in residential buildings and promoting eco-friendly practices.

Career Highlights: Throughout her illustrious career, Karen Elizabeth Petrillo has worked with top research institutions and leading tech companies to bring her inventions to life. Her dedication to creating cutting-edge solutions has earned her recognition in the industry.

Collaborations: Karen Elizabeth Petrillo has collaborated with renowned engineers, designers, and scientists to develop groundbreaking technologies. Her ability to work in multidisciplinary teams has led to the successful implementation of innovative ideas.

Conclusion: Karen Elizabeth Petrillo's innovative spirit and commitment to excellence continue to inspire aspiring inventors worldwide. Her impact on the world of technology is profound, and her legacy as a pioneering inventor is sure to endure for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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