The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 14, 2011

Filed:

Feb. 11, 2004
Applicants:

Wayne M. Moreau, Wappingers Falls, NY (US);

Marie Angelopoulos, Cortlandt Manor, NY (US);

Wu-song Huang, Poughkeepsie, NY (US);

David R. Medeiros, Ossining, NY (US);

Karen E. Petrillo, Voorheesville, NY (US);

Inventors:

Wayne M. Moreau, Wappingers Falls, NY (US);

Marie Angelopoulos, Cortlandt Manor, NY (US);

Wu-Song Huang, Poughkeepsie, NY (US);

David R. Medeiros, Ossining, NY (US);

Karen E. Petrillo, Voorheesville, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/36 (2006.01); G03F 7/38 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
Abstract

Resist compositions having good footing properties even on difficult substrates are obtained by using a combination of base additives including a room temperature solid base, and a liquid low vapor pressure base. The compositions are especially useful on metal substrates such as chromium-containing layers commonly used in mask-making.


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