IDiyas

For the Inventor, By the Inventor

Wappingers Falls, NY, United States of America

Wayne Martin Moreau

USPTO Granted Patents = 102


Average Co-Inventor Count = 5.1

ph-index = 22

Forward Citations = 1,468(Granted Patents)

DiyaCoin DiyaCoin = 0.36 


Inventors with similar research interests:


Location History:

  • Dutches County, NY (US) (1997)
  • Dutchess County, NY (US) (1996 - 2001)
  • Wappinger Falls, NY (US) (1976 - 2002)
  • Wappinger, NY (US) (1993 - 2009)
  • Wappingers Falls, NY (US) (1976 - 2014)

Company Filing History:

goldMedal99 out of 164,108 
 
International Business Machines Corporation
 patents
silverMedal1 out of 3 
 
Siemens Aktienesellschaft
 patents
bronzeMedal1 out of 2 
 
Lnternational Business Machines Corporation
 patents
4. 1 out of 507 
 
Clariant Finance (bvi) Limited
 patents
5. 1 out of 832,680 
Other
 patents
where one patent can have more than one assignee

Years Active: 1976-2014

where 'Filed Patents' based on already Granted Patents

102 patents (USPTO):
1. 8828143 - Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid (2014-09-09),
2. 8388758 - Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid (2013-03-05),
3. 7960095 - Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates (2011-06-14),
4. 7736833 - Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof (2010-06-15),
5. 7709177 - Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof (2010-05-04),
6. 7638266 - Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer (2009-12-29),
7. 7485964 - Dielectric material (2009-02-03),
8. 7361444 - Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof (2008-04-22),
9. 7332436 - Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition (2008-02-19),
10. 7314700 - High sensitivity resist compositions for electron-based lithography (2008-01-01),
11. 7288155 - Method for the rapid thermal control of a work piece in liquid or supercritical fluid (2007-10-30),
12. 7276327 - Silicon-containing compositions for spin-on arc/hardmask materials (2007-10-02),
13. 7270931 - Silicon-containing compositions for spin-on ARC/hardmask materials (2007-09-18),
14. 7168224 - Method of making a packaged radiation sensitive resist film-coated workpiece (2007-01-30),
15. 7081208 - Method to build a microfilter (2006-07-25),

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