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Wappingers Falls, NY, United States of America

Wayne Martin Moreau

USPTO Granted Patents = 102

EPO Patents = 1

Average Co-Inventor Count = 5.1

ph-index = 22

Forward Citations = 1,471(Granted Patents)

Forward Citations (Not Self Cited) = 1,437(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Dutches County, NY (US) (1997)
Dutchess County, NY (US) (1996 - 2001)
Wappinger Falls, NY (US) (1976 - 2002)
Wappinger, NY (US) (1993 - 2009)
Wappingers Falls, NY (US) (1976 - 2014)

Company Filing History:

99 out of 164,197

International Business Machines Corporation

Siemens Aktiengesell Schaft

Lnternational Business Machines Corporation

4. 1 out of 507

Clariant Finance (bvi) Limited

5. 1 out of 832,843

Other

patents

where one patent can have more than one assignee

Years Active: 1976-2014

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Areas of Expertise:

Rapid Thermal Control

Supercritical Fluid Processing

Multilayered Resist Systems

Silicon-Containing Compositions

Photoacid Generator Layer

Precision Surface Cleaning

Semiconductor Device Insulation

Electromechanical Devices

Energy Sensitive Admixtures

Radiation Sensitive Resists

Polymeric Materials

Nanometer Structure Film Deposition

102 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8828143 - Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid (2014-09-09),

2. 8388758 - Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid (2013-03-05),

3. 7960095 - Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates (2011-06-14),

4. 7736833 - Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof (2010-06-15),

5. 7709177 - Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof (2010-05-04),

6. 7638266 - Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer (2009-12-29),

7. 7485964 - Dielectric material (2009-02-03),

8. 7361444 - Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof (2008-04-22),

9. 7332436 - Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition (2008-02-19),

10. 7314700 - High sensitivity resist compositions for electron-based lithography (2008-01-01),

11. 7288155 - Method for the rapid thermal control of a work piece in liquid or supercritical fluid (2007-10-30),

12. 7276327 - Silicon-containing compositions for spin-on arc/hardmask materials (2007-10-02),

13. 7270931 - Silicon-containing compositions for spin-on ARC/hardmask materials (2007-09-18),

14. 7168224 - Method of making a packaged radiation sensitive resist film-coated workpiece (2007-01-30),

15. 7081208 - Method to build a microfilter (2006-07-25),

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