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For the Inventor, By the Inventor

Wappingers Falls, NY, United States of America

Wayne Martin Moreau

This inventor holds 102 USPTO granted patents and 1 EPO patent, primarily in Supercritical Fluid Processing (CPC class 430326). Top assignees: International Business Machines Corporation, Clariant Finance (Bvi) Limited, Lnternational Business Machines Corporation. Active years: 1976-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wayne Martin Moreau. Retrieved from https://idiyas.com/inventor/wayne-martin-moreau

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 102

% Patents Active = 64.7


Average Co-Inventor Count = 5.1

ph-index = 22

Forward Citations = 1,475(Granted Patents)

Forward Citations (Not Self Cited) = 1,437(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Dutches County, NY (US) (1997)
  • Dutchess County, NY (US) (1996 - 2001)
  • Wappinger Falls, NY (US) (1976 - 2002)
  • Wappinger, NY (US) (1993 - 2009)
  • Wappingers Falls, NY (US) (1976 - 2014)

Company Filing History:

goldMedal99 out of 166,425 
 
International Business Machines Corporation
 patents
silverMedal1 out of 507 
 
Clariant Finance (Bvi) Limited
 patents
bronzeMedal1 out of 2 
 
Lnternational Business Machines Corporation
 patents
4. 1 out of 30,893 
 
Siemens Aktiengesellschaft
 patents
5. 1 out of 834,601 
Other
 patents
where one patent can have more than one assignee

Years Active: 1976-2014

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Areas of Expertise:
Supercritical Fluid
Thermal Control
Multilayered Resist
Semiconductor Device
Photoacid Generator
Silicon Compositions
Microfilter
Residue Removal
Polymeric Materials
Electromechanical Device
Photoresist
Cleaning Process
102 patents (USPTO):Explore Patents
1. 8828143 - Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid (2014-09-09),
2. 8388758 - Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid (2013-03-05),
3. 7960095 - Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates (2011-06-14),
4. 7736833 - Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof (2010-06-15),
5. 7709177 - Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof (2010-05-04),
6. 7638266 - Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer (2009-12-29),
7. 7485964 - Dielectric material (2009-02-03),
8. 7361444 - Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof (2008-04-22),
9. 7332436 - Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition (2008-02-19),
10. 7314700 - High sensitivity resist compositions for electron-based lithography (2008-01-01),
11. 7288155 - Method for the rapid thermal control of a work piece in liquid or supercritical fluid (2007-10-30),
12. 7276327 - Silicon-containing compositions for spin-on arc/hardmask materials (2007-10-02),
13. 7270931 - Silicon-containing compositions for spin-on ARC/hardmask materials (2007-09-18),
14. 7168224 - Method of making a packaged radiation sensitive resist film-coated workpiece (2007-01-30),
15. 7081208 - Method to build a microfilter (2006-07-25),

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Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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