The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2008
Filed:
Oct. 15, 2004
John Michael Cotte, New Fairfield, CT (US);
Dario L. Goldfarb, Mohegan Lake, NY (US);
Pamela Jones, Bronx, NY (US);
Kenneth John Mccullough, Fishkill, NY (US);
Wayne Martin Moreau, Wappinger, NY (US);
Keith R. Pope, Danbury, CT (US);
John P. Simons, Wappingers Falls, NY (US);
Charles J. Taft, Wappingers Falls, NY (US);
John Michael Cotte, New Fairfield, CT (US);
Dario L. Goldfarb, Mohegan Lake, NY (US);
Pamela Jones, Bronx, NY (US);
Kenneth John McCullough, Fishkill, NY (US);
Wayne Martin Moreau, Wappinger, NY (US);
Keith R. Pope, Danbury, CT (US);
John P. Simons, Wappingers Falls, NY (US);
Charles J. Taft, Wappingers Falls, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A composition which includes liquid or supercritical carbon dioxide and an acid having a pKa of less than about 4. The composition is employed in a process of removing residue from a precision surface, such as a semiconductor sample, in which the precision surface is contacted with the composition under thermodynamic conditions consistent with the retention of the liquid or supercritical carbon dioxide in the liquid or supercritical state.